constant sheaf

The ion conduction properties for the films deposited by PVD(rf sputtering)in pure Ar atmosphere were studied with electric double layer capacity parameter method.

用 PMMA预聚合单体与 Li Cl O4粉末以不同比例直接混合均匀 ,固化成 3mm厚的板 ,以它为靶 ,在纯氩气气氛及 rf -溅射沉积条件下制备各种薄膜 ,用双电层电容常数法研究它们的离子导电性能。