excimer laser processing equipment for wafer stepper

Application of Alignment Simulation Software for PELDI;

电子束缩小投影曝光机对准模拟软件应用

Image Contrast of Projection Electron-beam Lithography with Demagnification Imaging(PELDI);

缩小投影电子束曝光系统的成像反差

Proof-of-Concept System for Projection Electron-Beam Lithography with Demagnification Imaging(PELDI);

缩小投影电子束曝光原理论证机

The fabrication, performance and use of the membrane plus scatterer mask for the projection electron beam lithography system are described.

介绍了用于电子束投影曝光系统中薄膜加散射体掩模的制备、性能和使用情

The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);

高能电子束缩小投影曝光机标记信号检测及对准技术的研究

electron beam projection exposure apparatus

电子束投影曝光装置

reducing electron beam projection system

缩小式电子束投影系统

The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.

可变矩形电子束曝光机的基本曝光图形是矩形。

reduction aligner

收缩式投影曝光装置

variable shaped electron beam exposure system

可变电子束曝光装置

cool beam low volatage electronic projective lamp

冷光束低压电子投影灯

Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;

纳米级电子束曝光机聚焦偏转系统的研究

E-beam Lithography Stage Controller Design Based on FPGA

基于FPGA的电子束曝光机工件台控制器设计

Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;

扫描电子束曝光机背散射电子检测与对准技术的研究

The E-beam Lithograpy Control System Based on VC++6.0

基于VC++6.0的电子束曝光控制系统

APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE

锁相技术在电子束曝光机工件台稳速控制中的应用

The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;

可变矩形电子束曝光机图形数据转换软件的实用化研制

microfilm exposed and developed

缩微胶片,已曝光和显影

Finally the lighting was finished and we just needed to adjust the tone mapping, the exposure and aperture of the camera to complete the image.

最后灯光设置结束后我们仅仅需要调节贴图色调，和摄影机曝光度和光圈大小来完成这张图片。

Study of Pattern Generator for Nanometer E-beam Lithography System;

纳米级电子束曝光系统用图形发生器技术研究

Measurement System of Precision Stage for E-Beam Aligner

电子束曝光系统中精密工件台的测量系统

Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning

电子束重复曝光加工PCR微通道的工艺研究